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Precision Thin Film Deposition Materials

AEM Deposition delivers ultra-high purity sputtering targets, evaporation materials, substrates, and crystal products for advanced thin film applications in optics, semiconductors, solar, and research.

About AEM Deposition

AEM Deposition is a leading provider of high-purity materials for thin film deposition technologies. With a focus on innovation and quality, we serve industries ranging from semiconductor manufacturing and solar energy to optical coatings and advanced research laboratories.

Our product portfolio includes sputtering targets, evaporation materials, crucibles, thin film substrates, and specialty crystals engineered to meet the most demanding performance standards.

99.999%

Max Purity Level

20+

Global Markets

15+ Years

Industry Experience

1000+

Products Available

Lab technician handling materials Material processing Quality inspection Packaging

Our Product Range

Comprehensive selection of high-purity materials for physical vapor deposition (PVD), chemical vapor deposition (CVD), and molecular beam epitaxy (MBE) processes.

Aluminum Sputtering Target

Purity: 99.999%

Size: 2" diameter x 0.25" thickness

Price: $60/pc

Chromium Sputtering Target

Purity: 99.95%

Size: 2" diameter x 0.25" thickness

Price: $70/pc

Copper Sputtering Target

Purity: 99.999%

Size: 2" diameter x 0.25" thickness

Price: $60/pc

Silicon Sputtering Target

Purity: 99.999%

Size: 2" diameter x 0.25" thickness

Price: $60/pc

Gallium Arsenide Substrate

Type: Semiconductor

Diameter: 2", Orientation: (100)

High resistivity GaAs wafers for epitaxial growth

Tungsten Boat

Material: Pure Tungsten

Grade: W1, High Density

Ideal for electron beam evaporation systems

Indium Evaporation Pellet

Purity: 99.999%

Form: 3mm diameter x 2mm height

Used in ITO and compound semiconductor deposition

Yttria-Stabilized Zirconia Crucible

Material: YSZ

Size: 20mm x 10mm (OD x H)

High temperature resistance up to 2200°C

Lithium Niobate Crystal

Type: Nonlinear Optical

Orientation: Z-cut, Size: 10x10x0.5mm

For modulators, frequency doublers, and sensors

Molybdenum Sputtering Target

Purity: 99.95%

Size: 3" diameter x 0.125" thickness

Used in solar cell and semiconductor applications

Germanium Evaporation Source

Purity: 99.999%

Form: 3mm cubes

For IR coating and semiconductor doping

ITO Sputtering Target

Composition: In2O3:SnO2 (90:10)

Purity: 99.99%, Size: 2" diameter

Transparent conductive oxide for displays and solar cells

Serving Advanced Industries

Our materials enable innovation across critical technology sectors.

Optics

Anti-reflective coatings, mirrors, filters, and optical components requiring high-purity deposition materials with precise stoichiometry and low defect density.

Solar Energy

Materials for photovoltaic cells including CIGS, perovskite, and thin-film silicon solar technologies, with high deposition efficiency and uniformity.

Electronics

Interconnects, barriers, and seed layers for semiconductor devices using high-purity copper, tantalum, titanium, and other advanced materials.

UHV/Synchrotron

Ultra-high vacuum compatible materials with extremely low outgassing rates for synchrotron beamline components and scientific instrumentation.

Hard & Decorative Coatings

Wear-resistant and aesthetically pleasing coatings for tools, automotive parts, and consumer products using nitrides, carbides, and diamond-like carbon.

Research & Development

Custom materials and small-batch production for academic and industrial R&D in nanotechnology, quantum materials, and next-generation devices.

Material quality control

Why Choose AEM Deposition?

  • Ultra-High Purity

    Materials with purity levels up to 99.999% (5N) and strict impurity control for critical applications.

  • Precision Engineering

    Tight dimensional tolerances and surface finishes optimized for consistent deposition performance.

  • Comprehensive Portfolio

    One of the broadest selections of deposition materials covering metals, alloys, oxides, and specialty compounds.

  • Global Support

    Dedicated technical support and logistics network serving customers in research institutions and manufacturing facilities worldwide.

Frequently Asked Questions

What purity levels do you offer for sputtering targets?

We offer sputtering targets with purity levels ranging from 99.9% (3N) to 99.999% (5N), depending on the material. High-purity materials are available for semiconductor and research applications.

Can you provide custom sizes and shapes?

Yes, we specialize in custom fabrication and can produce materials in various sizes, shapes, and configurations to meet your specific equipment requirements.

What is the typical lead time for orders?

Standard products typically ship within 1-2 weeks. Custom orders may require 3-6 weeks depending on complexity. We provide exact lead times upon inquiry.

Do you offer target bonding services?

Yes, we provide target bonding services for planar and rotary targets using indium or other suitable solders to ensure optimal thermal and electrical contact.

What packaging methods do you use?

Our materials are packaged in cleanroom conditions using anti-static, vacuum-sealed containers with desiccants to prevent contamination and oxidation during shipping.

Get in Touch

Contact us for product inquiries, technical support, or custom material requests.

+86-731-89578196
info@aemdeposition.com

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